Present status of multi-column cell exposure system for mask writing

Hiroshi Yasuda; Akio Yamada; Masaki Yamabe

doi:10.1117/12.824285

11 May 2009 Present status of multi-column cell exposure system for mask writing

Hiroshi Yasuda, Akio Yamada, Masaki Yamabe

Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 737918 (2009) https://doi.org/10.1117/12.824285
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan

Abstract

In the Mask D2I project at ASET, we are developing a novel electron beam exposure system using the concepts of MCC (multi column cell), CP (character projection), and VSB (variable shaped beam) to improve the throughput of electron beam exposure systems. In this paper we present the outline of a proof-of-concept system of MCC, results of the evaluation of fundamental functions of the system, and early writing results including multi column stitching. In the evaluation of fundamental functions of the system, we found that there is no interference on beam positions among the CCs, and that the beam position stability is quite good. In our early writing experiments, we had presented the first writing result of MCC and the first stitching result of a multi column system ever reported.

Citation Download Citation

Hiroshi Yasuda, Akio Yamada, and Masaki Yamabe "Present status of multi-column cell exposure system for mask writing", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737918 (11 May 2009); https://doi.org/10.1117/12.824285

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