Characterization of the focused beam of desktop 10-Hz capillary-discharge 46.9-nm laser

Ludek Vyšin; Tomás Burian; Jaromír Chalupský; Michael Grisham; Vera Hájková; Scott Heinbuch; Krzysztof Jakubczak; Dale Martz; Tomás Mocek; Peter Pira; Jirí Polan; Jorge J. Rocca; Bedrich Rus; Jaroslav Sobota; Libor Juha

doi:10.1117/12.822759

18 May 2009 Characterization of focused beam of desktop 10-Hz capillary-discharge 46.9-nm laser

Ludek Vyšin, Tomás Burian, Jaromír Chalupský, Michael Grisham, Vera Hájková, Scott Heinbuch, Krzysztof Jakubczak, Dale Martz, Tomás Mocek, Peter Pira, Jirí Polan, Jorge J. Rocca, Bedrich Rus, Jaroslav Sobota, Libor Juha

Author Affiliations +

Proceedings Volume 7361, Damage to VUV, EUV, and X-Ray Optics II; 73610O (2009) https://doi.org/10.1117/12.822759
Event: SPIE Optics + Optoelectronics, 2009, Prague, Czech Republic

Abstract

The desktop capillary-discharge Ne-like Ar laser (CDL) providing 10-μJ nanosecond pulses of coherent 46.9-nm radiation with a repetition rate up to 12 Hz was developed and built at the Colorado State University in Fort Collins and then installed in Prague. The beam of the laser was focused by a spherical mirror covered with Si/Sc multilayer coating onto the surface of poly(methyl methacrylate) - PMMA. Interaction parameters vary by changing the distance between sample surface and beam focus. The samples were exposed to various numbers of shots. Analysis of damaged PMMA by atomic force (AFM) and Nomarski (DIC - differential interference contrast) microscopes allows not only to determine the key characteristics of the focused beam (e.g. Rayleigh's parameter, focal spot diameter, tight focus position, etc.) but also to investigate mechanisms of the radiation-induced erosion processes.

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Ludek Vyšin, Tomás Burian, Jaromír Chalupský, Michael Grisham, Vera Hájková, Scott Heinbuch, Krzysztof Jakubczak, Dale Martz, Tomás Mocek, Peter Pira, Jirí Polan, Jorge J. Rocca, Bedrich Rus, Jaroslav Sobota, and Libor Juha "Characterization of focused beam of desktop 10-Hz capillary-discharge 46.9-nm laser", Proc. SPIE 7361, Damage to VUV, EUV, and X-Ray Optics II, 73610O (18 May 2009); https://doi.org/10.1117/12.822759

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