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16 March 2009 Alternative optical technologies: more than curiosities?
Bruce W. Smith
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Proceedings Volume 7274, Optical Microlithography XXII; 727402 (2009) https://doi.org/10.1117/12.817219
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States
Abstract
As optical lithography reaches it physical limits, alternative technologies become interesting. There have been several such alternatives that are still optical, but have some departure from conventional projection methods. This papers presents some of these alternative optical technologies, namely the use of surface plasmons and plasmonic lithography, metamaterials and superlenses, evanescent wave lithography, solid immersion lithography, and stimulated transmission depletion (StED) lithography. Additionally, the viability of interferometric lithography (IL) is addressed for application to sub-32nm generations by using an information content metric and comparing results to 193nm lithography, double patterning, and EUV.
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Bruce W. Smith "Alternative optical technologies: more than curiosities?", Proc. SPIE 7274, Optical Microlithography XXII, 727402 (16 March 2009); https://doi.org/10.1117/12.817219
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Cited by 4 scholarly publications.
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KEYWORDS
Lithography
193nm lithography
Optical lithography
Surface plasmons
Metamaterials
Metals
Dielectrics
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