CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 7273 > Article
Paper
10 April 2009 Immersion BARC for hyper NA applications
Wan-Ju Tseng, Wen Liang Huang, Bill Lin, Bo Jou Lu, Tsung Ju Yeh, E. T. Liu, Chun Chi Yu, Sue Ryeon Kim, Jeong Yun Yu, Gerald Wayton, Sook Lee, Sabrina Wong, Chaoyang Lin, Maurizio Ciambra, Suzanne Coley, David Praseuth, Kathleen O'Connell, George Barclay
Author Affiliations +
Proceedings Volume 7273, Advances in Resist Materials and Processing Technology XXVI; 727317 (2009) https://doi.org/10.1117/12.816393
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States
Abstract
Reflectivity control through angle is challenging at hyper NA, especially for Logic devices which have various pitches in the same layer. When patterning critical layers, a multilayer antireflectant system is required in order to control complex reflectivity resulting from various incident angles. Multilayer antireflectants typically consist of an organic and inorganic (TiN and SiON) layers. Fewer or thinner layers are desired for etch pattern transfer. However, it would make the reflectivity control through angle more difficult. We have investigated several antireflectants for a simplified multilayer stack. The organic films differ in terms of n, k, thickness and etch rate. The n, k, and thickness span the ranges of 1.60-1.85, 0.15-0.30, and 30-130nm, respectively. The overall patterning performance including profiles, line width roughness (LWR), overlap depth of focus margin (ODOF) and critical dimension uniformity (CDU) has been evaluated. An immersion tool at 1.35NA was used to perform lithography. Simulation was performed using ProlithTM software.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Wan-Ju Tseng, Wen Liang Huang, Bill Lin, Bo Jou Lu, Tsung Ju Yeh, E. T. Liu, Chun Chi Yu, Sue Ryeon Kim, Jeong Yun Yu, Gerald Wayton, Sook Lee, Sabrina Wong, Chaoyang Lin, Maurizio Ciambra, Suzanne Coley, David Praseuth, Kathleen O'Connell, and George Barclay "Immersion BARC for hyper NA applications", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 727317 (10 April 2009); https://doi.org/10.1117/12.816393
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 7 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Reflectivity
Metals
Multilayers
Etching
Line width roughness
Lithography
Control systems
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top