Advances in diffractive nanophotonics enabled by commercial photoreduction lithography

Christoph M. Greiner; Dmitri Iazikov; Thomas W. Mossberg

doi:10.1117/12.811619

24 February 2009 Advances in diffractive nanophotonics enabled by commercial photoreduction lithography

Christoph M. Greiner, Dmitri Iazikov, Thomas W. Mossberg

Proceedings Volume 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II; 72050L (2009) https://doi.org/10.1117/12.811619
Event: SPIE MOEMS-MEMS: Micro- and Nanofabrication, 2009, San Jose, California, United States

Abstract

We describe monolithic advanced-function diffraction grating arrays for instantaneous ultrawide spectral coverage and other uses that have inherent spectral and spatial self-calibration features. This new technology is made possible by recent advances in deep ultraviolet (DUV) reduction-lithographic fabrication.

Citation Download Citation

Christoph M. Greiner, Dmitri Iazikov, and Thomas W. Mossberg "Advances in diffractive nanophotonics enabled by commercial photoreduction lithography", Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050L (24 February 2009); https://doi.org/10.1117/12.811619

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