Dimensional nanometrology at the National Physical Laboratory

Andrew Yacoot; Richard Leach; Ben Hughes; Claudiu Giusca; Christopher Jones; Alan Wilson

doi:10.1117/12.807994

12 January 2009 Dimensional nanometrology at the National Physical Laboratory

Andrew Yacoot, Richard Leach, Ben Hughes, Claudiu Giusca, Christopher Jones, Alan Wilson

Author Affiliations +

Proceedings Volume 7133, Fifth International Symposium on Instrumentation Science and Technology; 713345 (2009) https://doi.org/10.1117/12.807994
Event: International Symposium on Instrumentation Science and Technology, 2008, Shenyang, China

Abstract

The growth in nanotechnology has led to an increased requirement for traceable dimensional measurements of nanometre-sized objects and micrometre-sized objects with nanometre tolerances. To meet this challenge NPL has developed both purpose built instrumentation and added metrology to commercially available equipment. This paper describes the development and use of a selection of these instruments that include: atomic force microscopy, x-ray interferometry, a low force balance, a micro coordinate measuring machine and an areal surface texture measuring instrument.

Citation Download Citation

Andrew Yacoot, Richard Leach, Ben Hughes, Claudiu Giusca, Christopher Jones, and Alan Wilson "Dimensional nanometrology at the National Physical Laboratory", Proc. SPIE 7133, Fifth International Symposium on Instrumentation Science and Technology, 713345 (12 January 2009); https://doi.org/10.1117/12.807994

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