Paper
17 October 2008 Characterizing OPC model accuracy versus lens induced polarization effects in hyper NA immersion lithography
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Abstract
Immersion lithography is extending the lifetime of optical lithography by enabling numerical aperture (NA) greater than unity. Along with scanner hardware improvements, modeling of hyper-NA lithography systems for optical proximity correction (OPC) is also continuing to be necessary in improving photolithography capability. With the use of hyper-NA immersion lithography and polarized illumination, the assumption of scalar optical pupil in optical system modeling may no longer be valid. To fully describe the transmission of any polarization state through the optical system, Jones matrix is necessary. It has been shown that Jones matrix can be described as a combination of apodization loss, birefringence, diattenuation, scalar phase aberrations, and rotation effects. In this work, the impact of such effects on calibration and accuracy of OPC models is characterized in terms of the model fit quality, model predictability, and changes to OPC results.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tamer M. Tawfik and Edita Tejnil "Characterizing OPC model accuracy versus lens induced polarization effects in hyper NA immersion lithography", Proc. SPIE 7122, Photomask Technology 2008, 712245 (17 October 2008); https://doi.org/10.1117/12.801516
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Cited by 2 scholarly publications.
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KEYWORDS
Optical proximity correction

Polarization

Calibration

Data modeling

Systems modeling

Apodization

Immersion lithography

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