Paper
17 October 2008 World wide matching of registration metrology tools of various generations
F. Laske, A. Pudnos, L. Mackey, P. Tran, M. Higuchi, C. Enkrich, K.-D. Roeth, K.-H. Schmidt, D. Adam, J. Bender
Author Affiliations +
Abstract
Turn around time/cycle time is a key success criterion in the semiconductor photomask business. Therefore, global mask suppliers typically allocate work loads based on fab capability and utilization capacity. From a logistical point of view, the manufacturing location of a photomask should be transparent to the customer (mask user). Matching capability of production equipment and especially metrology tools is considered a key enabler to guarantee cross site manufacturing flexibility. Toppan, with manufacturing sites in eight countries worldwide, has an on-going program to match the registration metrology systems of all its production sites. This allows for manufacturing flexibility and risk mitigation.In cooperation with Vistec Semiconductor Systems, Toppan has recently completed a program to match the Vistec LMS IPRO systems at all production sites worldwide. Vistec has developed a new software feature which allows for significantly improved matching of LMS IPRO(x) registration metrology tools of various generations. We will report on the results of the global matching campaign of several of the leading Toppan sites.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F. Laske, A. Pudnos, L. Mackey, P. Tran, M. Higuchi, C. Enkrich, K.-D. Roeth, K.-H. Schmidt, D. Adam, and J. Bender "World wide matching of registration metrology tools of various generations", Proc. SPIE 7122, Photomask Technology 2008, 712230 (17 October 2008); https://doi.org/10.1117/12.802941
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Metrology

Manufacturing

Distortion

Semiconductors

Image registration

Software development

Back to Top