Fabrication and characterization of a new high density Sc/Si multilayer sliced grating

Dmitriy L. Voronov; Rossana Cambie; Eric M. Gullikson; Valeriy V. Yashchuk; Howard A. Padmore; Yuri P. Pershin; Alexander G. Ponomarenko; Valeriy V. Kondratenko

doi:10.1117/12.795377

3 September 2008 Fabrication and characterization of a new high density Sc/Si multilayer sliced grating

Dmitriy L. Voronov, Rossana Cambie, Eric M. Gullikson, Valeriy V. Yashchuk, Howard A. Padmore, Yuri P. Pershin, Alexander G. Ponomarenko, Valeriy V. Kondratenko

Author Affiliations +

Proceedings Volume 7077, Advances in X-Ray/EUV Optics and Components III; 707708 (2008) https://doi.org/10.1117/12.795377
Event: Optical Engineering + Applications, 2008, San Diego, California, United States

Abstract

State of the art soft x-ray spectroscopy techniques like Resonant Inelastic X-ray Scattering (RIXS) require diffraction gratings which can provide extremely high spectral resolution of 10⁵-10⁶. This problem may be addressed with a sliced multilayer grating with an ultra-high groove density (up to 50,000 mm^-1) proposed in the recent publication [Voronov, D. L., et al., Proc. SPIE 6705, 67050E (2007)]. It has been suggested to fabricate such a grating by deposition of a soft x-ray multilayer on a substrate which is a blazed saw-tooth grating (echellette) with low groove density. Subsequent polishing applied to the coated grating removes part of the coating and forms an oblique-cut multiline structure that is a sliced multilayer grating. The resulting grating has a short-scale periodicity of lines (bilayers), which is defined by the multilayer period and the oblique-cut angle. We fabricated and tested a Sc/Si multilayer sliced grating suitable for EUV applications, which is a first prototype based on the suggested technique. In order to fabricate an echellette substrate, we used anisotropic KOH etching of a Si wafer. The etching regime was optimized to obtain smooth and flat echellette facets. A Sc/Si multilayer was deposited by dc-magnetron sputtering, and after that it was mechanically polished using a number of diamond pastes. The resulting sliced grating prototype with ~270 nm line period has demonstrated a dispersive ability in the 41-49 nm photon wavelength range with a diffraction efficiency of ~7% for the optimized 38th order assigned to the echellette grating of 10 μm period.

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Dmitriy L. Voronov, Rossana Cambie, Eric M. Gullikson, Valeriy V. Yashchuk, Howard A. Padmore, Yuri P. Pershin, Alexander G. Ponomarenko, and Valeriy V. Kondratenko "Fabrication and characterization of a new high density Sc/Si multilayer sliced grating", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 707708 (3 September 2008); https://doi.org/10.1117/12.795377

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