The Finite Element Method as applied to the calculation of the quantum efficiency in optoelectronic imaging devices

Guillaume Demésy; Frédéric Zolla; André Nicolet; Mireille Commandré; Caroline Fossati; Stéphane Ricq; Olivier Gagliano; Brendan Dunne

doi:10.1117/12.794825

4 September 2008 The Finite Element Method as applied to the calculation of the quantum efficiency in optoelectronic imaging devices

Guillaume Demésy, Frédéric Zolla, André Nicolet, Mireille Commandré, Caroline Fossati, Stéphane Ricq, Olivier Gagliano, Brendan Dunne

Author Affiliations +

Proceedings Volume 7030, Nanophotonic Materials V; 70300U (2008) https://doi.org/10.1117/12.794825
Event: NanoScience + Engineering, 2008, San Diego, California, United States

Abstract

We present a new formulation of the Finite Element Method (FEM) dedicated to the 2D rigorous solving of Maxwell equations adapted to the calculation of the diffracted field in optoelectronic subwavelength structures. The advantage of this method is that its implementation remains independent of the number of layers in the structure, of the number of diffractive patterns, of the geometry of the diffractive object and of the properties of the materials. The spectral response of large test photodiodes that can legitimately be represented in 2D has been measured on a dedicated optical bench and confronted to the theory. The representativeness of the model as well as the possibility of conceiving this way simply processable diffractive spectral filters are discussed.

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Guillaume Demésy, Frédéric Zolla, André Nicolet, Mireille Commandré, Caroline Fossati, Stéphane Ricq, Olivier Gagliano, and Brendan Dunne "The Finite Element Method as applied to the calculation of the quantum efficiency in optoelectronic imaging devices", Proc. SPIE 7030, Nanophotonic Materials V, 70300U (4 September 2008); https://doi.org/10.1117/12.794825

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