Subwavelength interferometric lithography with classical lights: toward 2-dimensional patterns

Qingqing Sun; M. Suhail Zubairy

doi:10.1117/12.797304

24 March 2008 Subwavelength interferometric lithography with classical lights: toward 2-dimensional patterns

Qingqing Sun, M. Suhail Zubairy

Proceedings Volume 6976, Quantum Information and Computation VI; 69760Z (2008) https://doi.org/10.1117/12.797304
Event: SPIE Defense and Security Symposium, 2008, Orlando, Florida, United States

Abstract

We review our schemes of subwavelength interferometric lighthography based on classical lights, and show the procedures to obtain arbitrary subwavelength 2D patterns by multiple exposures. The first scheme is by correlating wave vector and frequency in a narrow band, multiphoton detection process. The second scheme is by preparing the system in a position dependent trapping state via phase shifted standing wave patterns.

Citation Download Citation

Qingqing Sun and M. Suhail Zubairy "Subwavelength interferometric lithography with classical lights: toward 2-dimensional patterns", Proc. SPIE 6976, Quantum Information and Computation VI, 69760Z (24 March 2008); https://doi.org/10.1117/12.797304

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