Proposal for determining exposure latitude requirements

Harry J. Levinson; Yuansheng Ma; Marcel Koenig; Bruno La Fontaine; Rolf Seltmann

doi:10.1117/12.772711

1 April 2008 Proposal for determining exposure latitude requirements

Harry J. Levinson, Yuansheng Ma, Marcel Koenig, Bruno La Fontaine, Rolf Seltmann

Proceedings Volume 6924, Optical Microlithography XXI; 69241J (2008) https://doi.org/10.1117/12.772711
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

To determine the magnitude of the exposure latitude required for a process to be manufacturable, additional factors are considered that have a similar relationship between linewidth variation and image log-slope. Such parameters include resist thickness, flare, post-exposure bake temperature, and line-edge roughness. To obtain consistency between theory and experiment it is necessary to use the resist-edge log-slope generalization of image log-slope. Inclusion of these additional factors increases the required exposure latitude five to six times more than would be considered necessary from exposure tool dose control alone.

Citation Download Citation

Harry J. Levinson, Yuansheng Ma, Marcel Koenig, Bruno La Fontaine, and Rolf Seltmann "Proposal for determining exposure latitude requirements", Proc. SPIE 6924, Optical Microlithography XXI, 69241J (1 April 2008); https://doi.org/10.1117/12.772711

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