Studies of high index immersion lithography

Yasuhiro Ohmura; Hiroyuki Nagasaka; Tomoyuki Matsuyama; Toshiharu Nakashima; Teruki Kobayashi; Motoi Ueda; Soichi Owa

doi:10.1117/12.771622

7 March 2008 Studies of high index immersion lithography

Yasuhiro Ohmura, Hiroyuki Nagasaka, Tomoyuki Matsuyama, Toshiharu Nakashima, Teruki Kobayashi, Motoi Ueda, Soichi Owa

Proceedings Volume 6924, Optical Microlithography XXI; 692413 (2008) https://doi.org/10.1117/12.771622
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

High index immersion lithography is one of the candidates for next generation lithography technology following water immersion lithography. This technology may be most attractive for the industry since it is effective in raising resolution without seriously changing the chip making processes. This motivates us to continue to study further NA expansion although there are many challenges with respect to either high index fluid development or high index lens material development. In this paper, the current status of high index lithography development compared with the industry's requirements is discussed while considering design feasibility.

Citation Download Citation

Yasuhiro Ohmura, Hiroyuki Nagasaka, Tomoyuki Matsuyama, Toshiharu Nakashima, Teruki Kobayashi, Motoi Ueda, and Soichi Owa "Studies of high index immersion lithography", Proc. SPIE 6924, Optical Microlithography XXI, 692413 (7 March 2008); https://doi.org/10.1117/12.771622

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