Pixelated phase mask as novel lithography RET

Yan Borodovsky; Wen-Hao Cheng; Richard Schenker; Vivek Singh

doi:10.1117/12.772116

7 March 2008 Pixelated phase mask as novel lithography RET

Yan Borodovsky, Wen-Hao Cheng, Richard Schenker, Vivek Singh

Proceedings Volume 6924, Optical Microlithography XXI; 69240E (2008) https://doi.org/10.1117/12.772116
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Novel RET-Pixelated Phase Mask (PPM) is proposed as a novel Resolution Enhancement Technique (RET). PPM is made of pixels of various phases with lateral dimensions significantly smaller than the illuminating radiation wavelength. Such PPM with a singular choice of pixel dimensions acts as a mask with variable phase and transmission due to radiation scattering and attenuation on pixel features with the effective intensity and phase modulated by the pixel layout. Key properties of the pixelated phase masks, the steps for their practical realization, and the benefits to random logic products discussed. Wafer patterning performance and comparative functional yield results obtained for a 65nm node microprocessor patterned with PPM, as well as current PPM limitations are also presented.

Citation Download Citation

Yan Borodovsky, Wen-Hao Cheng, Richard Schenker, and Vivek Singh "Pixelated phase mask as novel lithography RET", Proc. SPIE 6924, Optical Microlithography XXI, 69240E (7 March 2008); https://doi.org/10.1117/12.772116

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