Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography: Part II

Osamu Nakayama; Takashi Fukumoto; Miki Tachibana; Junko Sato; Masahiko Kitayama; Tsuyoshi Kajiyashiki

doi:10.1117/12.771130

15 April 2008 Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography: Part II

Osamu Nakayama, Takashi Fukumoto, Miki Tachibana, Junko Sato, Masahiko Kitayama, Tsuyoshi Kajiyashiki

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69233F (2008) https://doi.org/10.1117/12.771130
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

We synthesized several new monomers with an acid-cleavable protective group and investigated their deprotection reactions. Polymers were prepared using these monomers, and their thermal properties and dissolution rates were investigated. The acidic reactivity of protective groups of these monomers was evaluated using a method we developed. The activation energies [E_a(experimental)] calculated using reaction rate constants were found to correlate to some extent with the activation energies [E_a(calculated)] calculated from MOPAC. The dissolution rates of some polymers containing similar protective groups as structures were measured. The dissolution rates were related to the polarity and molecular volume (MV) of the decomposed products of protective groups.

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Osamu Nakayama, Takashi Fukumoto, Miki Tachibana, Junko Sato, Masahiko Kitayama, and Tsuyoshi Kajiyashiki "Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography: Part II", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69233F (15 April 2008); https://doi.org/10.1117/12.771130

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