Options for high index fluids for third generation 193i lithography

Seth Kruger; Srividya Revuru; Shao-Zhong Zhang; Dimitri D. Vaughn II; Eric Block; Paul Zimmerman; Robert L. Brainard

doi:10.1117/12.772994

15 April 2008 Options for high index fluids for third generation 193i lithography

Seth Kruger, Srividya Revuru, Shao-Zhong Zhang, Dimitri D. Vaughn II, Eric Block, Paul Zimmerman, Robert L. Brainard

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69231O (2008) https://doi.org/10.1117/12.772994
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Successful fluids for use in 3rd generation 193 nm immersion lithography must have refractive indices of ≥ 1.80 at 193 nm, ≤ 0.15/cm absorbance at 193 nm, and be photochemically inert to 193 nm radiation. Various classes of organic compounds were prepared and evaluated for use as 3rd generation 193 nm immersion fluids. Functional groups that were evaluated included: sulfones, sulfoxides, sulfonic acids, ammonium sulfonate salts, alkanes, alkyl chlorides, alkynes, and nitriles. Several compounds were synthesized including three sulfone and three sulfonic acid compounds. Other commercially available compounds of interest underwent extensive purification prior to evaluation. Although this work did not lead to any specific solutions to the challenge of identifying 3rd generation 193 nm immersion fluids, it can be concluded that high density hydrocarbons based on cubane may have the best chance of meeting these goals.

Citation Download Citation

Seth Kruger, Srividya Revuru, Shao-Zhong Zhang, Dimitri D. Vaughn II, Eric Block, Paul Zimmerman, and Robert L. Brainard "Options for high index fluids for third generation 193i lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231O (15 April 2008); https://doi.org/10.1117/12.772994

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