Parametric tradeoffs in laser plasma sources for EUV lithography: debris versus radiators

Davide Bleiner; Bob Rollinger; Reza S. Abhari

doi:10.1117/12.772613

21 March 2008 Parametric tradeoffs in laser plasma sources for EUV lithography: debris versus radiators

Davide Bleiner, Bob Rollinger, Reza S. Abhari

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69210X (2008) https://doi.org/10.1117/12.772613
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

A mass spectrometry and time-resolved shadowgraphy study is presented, focusing on the radiators/debris transport process for an LPP-EUVL source, under worst-case scenarios such as solid target, wide angular dispersion, etc. The solid angle of ion debris ejection increases as a function of plume lifetime, and up to 0.5 μs (approx. 15 mm above target) does not exceed 0.3 πsr. around the target normal. The plume expansion is hypersonic (15-20 km/s) with the formation of a bow shock with an initial length scale of 5-8 mm that gradually reduces its aspect ratio. Primary (low energy) ion debris is induced directly during laser-surface interaction, whereas almost 90% of these primary ions are converted to Z=6 -12 secondary fast ions by means of laser-plasma interaction. At very high laser power, the fraction of primary ions converted to high charge ions is diminished to 70%, possibly due to increased LPP shielding. Hence, the external atomic degrees of freedom (kinetic energy) and the internal degrees of freedom (electronic configuration) are pumped concomitantly, which presents a tradeoff to combine fast ion debris minimization and efficient radiators' maximization. Nevertheless, the radiating body is observed fairly static with time, with a length-scale of a few mm's. Hence, the decoupling of the mass flux and radiation flux may be achieved either in the short (10< t < 100 ns) or in the very long (t > 500 ns) time scales. Considering the EUV emission time scale constraints, the former is the only viable solution for enabling LPP-based EUVL.

Citation Download Citation

Davide Bleiner, Bob Rollinger, and Reza S. Abhari "Parametric tradeoffs in laser plasma sources for EUV lithography: debris versus radiators", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210X (21 March 2008); https://doi.org/10.1117/12.772613

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
11 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Ions

Tin

Extreme ultraviolet

Plasma

Extreme ultraviolet lithography

Solids

Visualization

Show All Keywords

Keywords/Phrases

Search In:

Publication Years