Direct readout based on the UV-Vis spectral changes: toward the most convenient nondestructive data processing

Zihui Chen; Zhongyu Li; Yuejing Bin; Lei Huang; Fushi Zhang

doi:10.1117/12.753969

15 January 2008 Direct readout based on the UV-Vis spectral changes: toward the most convenient nondestructive data processing

Zihui Chen, Zhongyu Li, Yuejing Bin, Lei Huang, Fushi Zhang

Author Affiliations +

Proceedings Volume 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography; 682714 (2008) https://doi.org/10.1117/12.753969
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

Diarylethene is a promising material for future high-density, high-speed, photo-mode storage because of their intriguing properties such as thermal stability and fatigue resistance. However, the practical application requires more endeavors since there are some flask-necked problems still unsolved. Among these problems, nondestructive readout is the most noticeable though several strategies for circumventing this problem have been proposed. Herein, we reported our work toward the most convenient nondestructive data processing -- UV-Vis readout. For this purpose, a novel family of diarylethene (DTE)-phthalocyanine (Pc) dyad system was designed and synthesized. In these molecules, DTE serve as the "write moiety" while the Pc serve as "read moiety". It is found that the significant change in the extension of linear π-conjugation of the DTE when irradiated by 254 nm UV light directly made the absorption of the Q-band of phthalocyanine decreases. Detecting the absorption changes of the Q-band cannot induce the reversible photochromic reaction. Therefore, non-destructive readout is feasible based on the spectral changes of the Q-band when such materials were used as storage media

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Zihui Chen, Zhongyu Li, Yuejing Bin, Lei Huang, and Fushi Zhang "Direct readout based on the UV-Vis spectral changes: toward the most convenient nondestructive data processing", Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 682714 (15 January 2008); https://doi.org/10.1117/12.753969

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KEYWORDS

Absorption

Nondestructive evaluation

Ultraviolet radiation

Data processing

Absorbance

UV-Vis spectroscopy

Resistance

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