Simulation of a small Si plate oxidation in a cwCO2 laser light

Stefan Balint; Agneta M. Balint; Robert Szabo

doi:10.1117/12.738259

16 October 2007 Simulation of a small Si plate oxidation in a cwCO₂ laser light

Stefan Balint, Agneta M. Balint, Robert Szabo

Proceedings Volume 6740, Optical Materials in Defence Systems Technology IV; 67400K (2007) https://doi.org/10.1117/12.738259
Event: Optics/Photonics in Security and Defence, 2007, Florence, Italy

Abstract

In the framework of a nonisothermal model it is shown that in the spot of cwCO₂ laser of power P the temperature of a small bare Si plate increases from T'=300[K] to an equilibrium temperature T₀(P). The moment of time t₁(P) at which T₀(P) is achieved, t₀(P) at which the oxide layer of 1 nm is formed, the sample temperature at t₀(P), the oxide layer thickness at t₁(P), the oxide layer growth rate at t₀(P), and t₁(P) are computed, for dry and wet oxidation and for <100> and <111> oriented samples. How well the computed results are in agreement with the experimental results depends on the magnitude of the effect of the processes which were not incorporated in the model. The advantage of this analysis is the possibility to obtain explicit results from which the limits of the model can be specified and special results can be gleaned. With this aim this study was undertaken.

Citation Download Citation

Stefan Balint, Agneta M. Balint, and Robert Szabo "Simulation of a small Si plate oxidation in a cwCO₂ laser light", Proc. SPIE 6740, Optical Materials in Defence Systems Technology IV, 67400K (16 October 2007); https://doi.org/10.1117/12.738259

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