Coping with double-patterning/exposure lithography by EB mask writer EBM-6000

Takashi Kamikubo; Rieko Nishimura; Kaoru Tsuruta; Kiyoshi Hattori; Jun Takamatsu; Shusuke Yoshitake; Hiroshi Nozue; Hitoshi Sunaoshi; Shuichi Tamamushi

doi:10.1117/12.747745

30 October 2007 Coping with double-patterning/exposure lithography by EB mask writer EBM-6000

Takashi Kamikubo, Rieko Nishimura, Kaoru Tsuruta, Kiyoshi Hattori, Jun Takamatsu, Shusuke Yoshitake, Hiroshi Nozue, Hitoshi Sunaoshi, Shuichi Tamamushi

Author Affiliations +

Proceedings Volume 6730, Photomask Technology 2007; 673031 (2007) https://doi.org/10.1117/12.747745
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

Double exposure / Double pattering methodologies are being adopted to extend 193nm optical lithography until the next generation lithography, most likely the EUV, is solidified. The Double exposure / Double patterning methodologies require tighter image-placement accuracy and Critical Dimension (CD) controls on a mask than the conventional single exposure technique. NuFlare Technology's mask writer, EBM-6000 (1), is capable of achieving the required CD control and high patterning resolution as fine as 35 nm, that are required for the hp 45nm lithography with Double exposure / Double patterning methodologies, when newly developed resist (i.e. "low-sensitivity" resist) is used, as shown at several occasions to date. Further, image-placement control with EBM-6000 has been improved based on extensive error budget analysis to comply with the tight image-placement specifications required by the Double exposure / Double Patterning lithography. This paper will show the results of the analysis and improvement of the image-placement accuracy of EBM-6000 series mask writers.

Citation Download Citation

Takashi Kamikubo, Rieko Nishimura, Kaoru Tsuruta, Kiyoshi Hattori, Jun Takamatsu, Shusuke Yoshitake, Hiroshi Nozue, Hitoshi Sunaoshi, and Shuichi Tamamushi "Coping with double-patterning/exposure lithography by EB mask writer EBM-6000", Proc. SPIE 6730, Photomask Technology 2007, 673031 (30 October 2007); https://doi.org/10.1117/12.747745

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