Multilayer growth in the APS rotary deposition system

Ray Conley; Chian Liu; Cameron M. Kewish; Albert T. Macrander; Christian Morawe

doi:10.1117/12.736024

20 September 2007 Multilayer growth in the APS rotary deposition system

Ray Conley, Chian Liu, Cameron M. Kewish, Albert T. Macrander, Christian Morawe

Proceedings Volume 6705, Advances in X-Ray/EUV Optics and Components II; 670505 (2007) https://doi.org/10.1117/12.736024
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

We report our progress in the growth of periodic and depth-graded multilayers in the APS rotary deposition system, a machine designed for fabrication of films tens of microns thick with thousands of layers. A computational method was employed to design depth-graded multilayers for use as wide-angular bandpass reflective optics. We present experimental results for a 154-layer WSi₂/Si multilayer system with bilayer thickness ranging from 2.2 nm to 5.5 nm that closely match theoretical flat-top reflectivity predictions of 9.8% from 15.6 mrad to 23.3 mrad at 8 keV.

Citation Download Citation

Ray Conley, Chian Liu, Cameron M. Kewish, Albert T. Macrander, and Christian Morawe "Multilayer growth in the APS rotary deposition system", Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 670505 (20 September 2007); https://doi.org/10.1117/12.736024

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