Study on diazonaphthoquinone positive photoresist composition for LCD

Fangyu Zhou; Yingquan Zou; Zhanbin Zhang

doi:10.1117/12.714323

9 April 2007 Study on diazonaphthoquinone positive photoresist composition for LCD

Fangyu Zhou, Yingquan Zou, Zhanbin Zhang

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65194C (2007) https://doi.org/10.1117/12.714323
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

We report on a study of the diazonaphthoquinone (DNQ) positive photoresist composition for LCD. Photoresist is the important material used for the electrode of LCD. LCD photoresist consists of photoactive compounds, binder resin and organic solvent. We first study the esterification of 3,4,5-trihydroxybenzophenone, 2,2',4,4'-tetrahydroxybenzophenone and 1,2-DNQ-4-or-5-sulfonylchloride, then the conventional photoactive compounds were synthesized. The properties of the conventional photoresist composition were also studied. Our work focuses on exploring new type of photoactive compounds. We prepared the new phenol compounds: 7,8-dihydroxy-4-methylcoumarin, 6,7-dihydroxy-3,3-diphenyl-3H-benzenefuran-2- ketone, and then reacted with 1,2-DNQ-4-or-5-sulfonyl chloride. The new photoactive compounds were used with PGMEA as organic solvent and the novolac resin as binder resin, then the photoresist composition was prepared. The photoresist composition was coated on the pretreated ITO films and ITO glasses. After the prebake, exposure, developing, hard bake, a desired pattern was produced . The properties of photoresist composition, for example: photosensitivity, resolution and developing performance were good, and the photosensitivity can reach to 40.5mJ.cm-2, the resolution can be 1&mgr;m.

Citation Download Citation

Fangyu Zhou, Yingquan Zou, and Zhanbin Zhang "Study on diazonaphthoquinone positive photoresist composition for LCD", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65194C (9 April 2007); https://doi.org/10.1117/12.714323

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KEYWORDS

Photoresist materials

Photoresist developing

LCDs

Glasses

Chemical elements

Oxygen

Chemical species

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