Direct measurement of the in-situ developed latent image: the residual swelling fraction

Vivek M. Prabhu; Bryan D. Vogt; Shuhui Kang; Ashwin Rao; Eric K. Lin; Sushil K. Satija; Karen Turnquest

doi:10.1117/12.712311

22 March 2007 Direct measurement of the in-situ developed latent image: the residual swelling fraction

Vivek M. Prabhu, Bryan D. Vogt, Shuhui Kang, Ashwin Rao, Eric K. Lin, Sushil K. Satija, Karen Turnquest

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 651910 (2007) https://doi.org/10.1117/12.712311
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

The spatial distribution of polymer photoresist and deuterium labeled developer highlights a fraction of material at a model line edge that swells, but does not dissolve. This residual swelling fraction remains swollen during both the in situ development and rinse steps uncovering that the final lithographic feature is resolved by a collapse mechanism during the drying step. We demonstrate that contrast variant neutron reflectivity provides a general method to probe the nanometer resolved in situ development and rinse process step.

Citation Download Citation

Vivek M. Prabhu, Bryan D. Vogt, Shuhui Kang, Ashwin Rao, Eric K. Lin, Sushil K. Satija, and Karen Turnquest "Direct measurement of the in-situ developed latent image: the residual swelling fraction", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651910 (22 March 2007); https://doi.org/10.1117/12.712311

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