Köhler illumination analysis for high-resolution optical metrology using 193 nm light

Yeungjoon Sohn; Richard M. Silver

doi:10.1117/12.714890

13 April 2007 Köhler illumination analysis for high-resolution optical metrology using 193 nm light

Yeungjoon Sohn, Richard M. Silver

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 65184V (2007) https://doi.org/10.1117/12.714890
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Dependence of Köhler factor 2 (KF 2: angular homogeneity) and Köhler factor 3 (KF 3: wavefront homogeneity) on the intensity profile of line target was investigated for an optical system designed for high-resolution optical metrology using ArF excimer laser of a wavelength of 193 nm. The intensity profiles for the isolated and multiple lines of 60 nm linewidth were simulated based on the diffraction propagation by introducing the changes of NA (KF 2) and aberrations such as defocus and coma (KF 3) to the illumination beam. From the results it was demonstrated that the intensity profiles for the line targets were influenced by the change of the illumination condition, being distorted in shape and magnitude.

Citation Download Citation

Yeungjoon Sohn and Richard M. Silver "Köhler illumination analysis for high-resolution optical metrology using 193 nm light", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65184V (13 April 2007); https://doi.org/10.1117/12.714890

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