Paper
8 February 2007 Comprehensive study of reliability of InGaN-based laser diodes
L. Marona, M. Sarzynski, P. Wi?niewski, M. Leszczy?ski, P. Prystawko, I. Grzegory, T. Suski, S. Porowski, R. Czernecki, G. Kamler, A. Czerwinski, M. Pluska, J. Ratajczak, P. Perlin
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Abstract
In this work we present the reliability study of InGaN violet laser diodes fabricated by metaloorganic vapor phase epitaxy on high pressure grown bulk GaN crystals. Our devices were tested both in cw and a pulse regime. We found out that the degradation rate of the laser diodes does not depend on the photon density (at least up to around 50 mW of an output optical power). We show also that the main factor influencing the degradation rate is an operation current density on which the degradation rate depends exponentially. Additionally, we reconfirm that the degradation follows the square root dependence between threshold current and time suggesting that the diffusion may be a main mechanism causing damage of diodes.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. Marona, M. Sarzynski, P. Wi?niewski, M. Leszczy?ski, P. Prystawko, I. Grzegory, T. Suski, S. Porowski, R. Czernecki, G. Kamler, A. Czerwinski, M. Pluska, J. Ratajczak, and P. Perlin "Comprehensive study of reliability of InGaN-based laser diodes", Proc. SPIE 6485, Novel In-Plane Semiconductor Lasers VI, 648504 (8 February 2007); https://doi.org/10.1117/12.699001
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Cited by 3 scholarly publications.
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KEYWORDS
Semiconductor lasers

Gallium nitride

Reliability

Laser damage threshold

Diffusion

Indium gallium nitride

Crystals

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