Paper
20 February 2007 Growth and characterization of doped ZnO films
A. K. Pradhan, H. Mustafa, L. Douglas, R. Mundle, D. Hunter, K. Lord, T. Williams, R. Konda, O. Bamiduro, E. Annih, C. E. Bonner, I. V. Kityk
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Abstract
We report here the synthesis of ZnO films by the pulsed-laser deposition technique using various novel conditions. The dopants are As, Ga, Al and N. The films show excellent crystalline quality with atomically smooth surface morphology. The electrical resistivity was found to be close to 2 x~10-4 ohm-cm and transmittance >85% with both Ga and Al doping. Doping with As shows several distinct transitions in their electrical resistivity and strong aging effects. On the other hand, doping with Mn in ZnO reduces the grain size. On the other hand, doping with trivalent Er ions in ZnO films causes two effects: for high doping (>8 wt%), a substantial enhancement of diagonal piezo-optic effect (up to 3.7*10-13 m2/N at &lgr;=633 nm) was observed due to creation of additional dipole moments at the interface of the film and the substrate, and higher electrical conductivity with enhanced 1.54 &mgr;m emission was demonstrated at room temperature for low concentration (<2 wt%) of Er. Furthermore, no quenching effects in emission characteristics at 1.54 &mgr;m were observed up to 2 wt % of Er-doping in ZnO at room-temperature.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. K. Pradhan, H. Mustafa, L. Douglas, R. Mundle, D. Hunter, K. Lord, T. Williams, R. Konda, O. Bamiduro, E. Annih, C. E. Bonner, and I. V. Kityk "Growth and characterization of doped ZnO films", Proc. SPIE 6474, Zinc Oxide Materials and Devices II, 647417 (20 February 2007); https://doi.org/10.1117/12.713681
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KEYWORDS
Zinc oxide

Erbium

Doping

Aluminum

Semiconductors

Ions

Oxygen

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