Three-dimensional deposition of silicon from silicate glass with dispersed metallic aluminum by a femtosecond laser

K. Miura; Y. Shimotsuma; M. Sakakura; S. Kanehira; M. Hamabe; K. Hirao

doi:10.1117/12.695925

22 December 2006 Three-dimensional deposition of silicon from silicate glass with dispersed metallic aluminum by a femtosecond laser

K. Miura, Y. Shimotsuma, M. Sakakura, S. Kanehira, M. Hamabe, K. Hirao

Author Affiliations +

Proceedings Volume 6413, Smart Materials IV; 64130K (2006) https://doi.org/10.1117/12.695925
Event: SPIE Smart Materials, Nano- and Micro-Smart Systems, 2006, Adelaide, Australia

Abstract

We have fabricated silicon structure in silicate glass prepared with metallic aluminum in the starting material, using femtosecond laser irradiation and subsequent annealing. Small Si-rich structures such as oxygen-deficiency (O-deficiency) defects or Si clusters transform into nano-sized Si particles by the focusing irradiation of the laser. Then the Si-rich structures grow into micro-size particles due to the thermite reaction promoted by heat treatment. We determine the effect of focused laser pulse on the Si deposition process by using a time-resolved transient lens method with a sub-picosecond laser pulse. Localized high-temperature, high-pressure, and the generation of shock waves appear to be very important in forming the Si-rich structures that ultimately grow into Si particles. The diffusion of oxygen by shock waves and the existence of Al-rich structures help form Si-rich structures as Si-O bonds continuously break under high temperature. The focusing irradiation of femtosecond lasers is very useful for fabricating Si structures inside glass.

Citation Download Citation

K. Miura, Y. Shimotsuma, M. Sakakura, S. Kanehira, M. Hamabe, and K. Hirao "Three-dimensional deposition of silicon from silicate glass with dispersed metallic aluminum by a femtosecond laser", Proc. SPIE 6413, Smart Materials IV, 64130K (22 December 2006); https://doi.org/10.1117/12.695925

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