Extreme ring fields in microlithography

Alexander Epple

doi:10.1117/12.692313

18 July 2006 Extreme ring fields in microlithography

Alexander Epple

Proceedings Volume 6342, International Optical Design Conference 2006; 63421R (2006) https://doi.org/10.1117/12.692313
Event: International Optical Design Conference 2006, 2006, Vancouver, BC, Canada

Abstract

A design study leading to a new inline catadioptric design type is presented. The design is especially dedicated to be used with extreme ring field geometries not known in lithography optics so far. This may allow to increase the numerical aperture to the physical limits both in dry and immersion lithography. An exemplary system with high numerical aperture is shown.

Citation Download Citation

Alexander Epple "Extreme ring fields in microlithography", Proc. SPIE 6342, International Optical Design Conference 2006, 63421R (18 July 2006); https://doi.org/10.1117/12.692313

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