Engineering photonic nanostructure profiles using nanosphere lithography and reactive-ion etching

Jinsong Wang; Yang Zhao; Guangzhao Mao

doi:10.1117/12.679628

29 August 2006 Engineering photonic nanostructure profiles using nanosphere lithography and reactive-ion etching

Jinsong Wang, Yang Zhao, Guangzhao Mao

Proceedings Volume 6308, Photonics for Space Environments XI; 63080H (2006) https://doi.org/10.1117/12.679628
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Two-dimensional periodic structures with nanometer feature sizes have been widely used in many photonic devices. The profile and size of the nanostructure elements can greatly affect optical performances. Various practical subwavelength structures working in the visible and near infrared region have been fabricated using electron-beam writing or laser interference techniques. In this paper, we present a new technique which use nanosphere lithography (NSL) and reactive-ion etching to fabricate two-dimensional nanostructures with tunable nanoelement size and profile.

Citation Download Citation

Jinsong Wang, Yang Zhao, and Guangzhao Mao "Engineering photonic nanostructure profiles using nanosphere lithography and reactive-ion etching", Proc. SPIE 6308, Photonics for Space Environments XI, 63080H (29 August 2006); https://doi.org/10.1117/12.679628

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