Measuring system for radiation pulses from gas-puff laser-plasma source

Zbigniew Bielecki; Janusz Mikołajczyk; Rafał Rakowski; Jacek Wojtas

doi:10.1117/12.663240

22 April 2006 Measuring system for radiation pulses from gas-puff laser-plasma source

Zbigniew Bielecki, Janusz Mikołajczyk, Rafał Rakowski, Jacek Wojtas

Proceedings Volume 6189, Optical Sensing II; 618915 (2006) https://doi.org/10.1117/12.663240
Event: SPIE Photonics Europe, 2006, Strasbourg, France

Abstract

The paper presents a measuring system of extreme ultraviolet radiation pulses (13.5 nm). The system is used for monitoring a gas-puff laser-plasma source constructed at the Institute of Optoelectronics. The radiation source and the system are used in metrology of EUV optics. The system consists of a detection head and a system of optical filters, which are housing in a special construction. Additional element of the measuring system is a special processing unit. The measuring system was used during investigations of the plasma-laser optimization. The results were comparable with the ones from a spectrograph and an Emon energy meter.

Citation Download Citation

Zbigniew Bielecki, Janusz Mikołajczyk, Rafał Rakowski, and Jacek Wojtas "Measuring system for radiation pulses from gas-puff laser-plasma source", Proc. SPIE 6189, Optical Sensing II, 618915 (22 April 2006); https://doi.org/10.1117/12.663240

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