Measurement, separation, and amelioration of transverse scanning synchronization error

Yuji Yamaguchi; Ranjan Khurana; Adlai H. Smith; Venky Subramony; Calvin Chen Chii Wean; Joseph J. Bendik

doi:10.1117/12.674471

21 March 2006 Measurement, separation, and amelioration of transverse scanning synchronization error

Yuji Yamaguchi, Ranjan Khurana, Adlai H. Smith, Venky Subramony, Calvin Chen Chii Wean, Joseph J. Bendik

Proceedings Volume 6154, Optical Microlithography XIX; 615443 (2006) https://doi.org/10.1117/12.674471
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The need for lithographic tool advances for reducing feature size, pitch (low k1 processing), and improving overlay stems directly from next generation circuit layout and performance roadmaps¹. Overlay error or layer-to-layer misalignment tolerances have continued to decrease to the point where a few nanometers of misalignment can seriously impact process and device yields. In this work, we expand our previous work² and introduce a new scanner aberration monitoring methodology that can both measure and deconvolve lens distortion from scanning synchronization error while simultaneously providing machine corrections for accurate tool matching. Experimental data taken from several machines suggests it is possible to ameliorate scanning synchronization error for each machine and improve tool-to-tool matching at the level required for next generation processing. Finally, we discuss applications of this new technology including practical fab implementation and discovering problematic scanning tool signatures.

Citation Download Citation

Yuji Yamaguchi, Ranjan Khurana, Adlai H. Smith, Venky Subramony, Calvin Chen Chii Wean, and Joseph J. Bendik "Measurement, separation, and amelioration of transverse scanning synchronization error", Proc. SPIE 6154, Optical Microlithography XIX, 615443 (21 March 2006); https://doi.org/10.1117/12.674471

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