Pupil and illuminator optimization in partially coherent imaging systems

Igor Ivonin; Tor Sandstrom

doi:10.1117/12.656357

20 March 2006 Pupil and illuminator optimization in partially coherent imaging systems

Igor Ivonin, Tor Sandstrom

Proceedings Volume 6154, Optical Microlithography XIX; 61543U (2006) https://doi.org/10.1117/12.656357
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The ability of optical imaging system to print in a particular node is determined by both CD linearity and resolution characteristics of the system. We present a general (i.e. nonparametric) method of optimization of partially coherent optical system (i.e. both polarizing/nonpolarizing pupil and illuminator) for the printing of any particular set of objects in the best possible printing node. The method turns out to be equivalent to an iterative quadratic-linear programming problem with inequality constraints. Additional requirements, such as, for instance, the focus sensitivity, are introduced naturally as the additional constraints. We present also the results of a hypothetical SLM-based mask writer optimization.

Citation Download Citation

Igor Ivonin and Tor Sandstrom "Pupil and illuminator optimization in partially coherent imaging systems", Proc. SPIE 6154, Optical Microlithography XIX, 61543U (20 March 2006); https://doi.org/10.1117/12.656357

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