A hyper-NA projection lens for ArF immersion exposure tool

Hironori Ikezawa; Yasuhiro Ohmura; Tomoyuki Matsuyama; Yusaku Uehara; Toshiro Ishiyama

doi:10.1117/12.656083

15 March 2006 A hyper-NA projection lens for ArF immersion exposure tool

Hironori Ikezawa, Yasuhiro Ohmura, Tomoyuki Matsuyama, Yusaku Uehara, Toshiro Ishiyama

Proceedings Volume 6154, Optical Microlithography XIX; 615421 (2006) https://doi.org/10.1117/12.656083
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Resolution enhancement in ArF dry lithography is limited by the numerical aperture (NA), which cannot be extended past the physical limit of 1.0. Immersion lithography is proposed as a candidate to overcome this limitation as resolution can be enhanced with a hyper-NA immersion projection lens. In addition, depth of focus (DOF) can be extended owing to the small incident angle for marginal rays onto the image plane. Our development of immersion optics can be divided into three phases. First, the initial evaluation has successfully been conducted in the engineering evaluation tool (EET), in which the projection optics is converted from dry-use to wet-use while retaining the same NA, 0.85. Second, the projection optics with 1.07NA has been developed aiming at devices with 50-55nm half-pitch (hp) patterns. The optics, comprising only the refractive elements, is exclusively dedicated to immersion usage. Third, catadioptric optics with 1.3NA targeting at 45nm hp devices is intensively studied. This paper will focus on the second and the third phases of the development.

Citation Download Citation

Hironori Ikezawa, Yasuhiro Ohmura, Tomoyuki Matsuyama, Yusaku Uehara, and Toshiro Ishiyama "A hyper-NA projection lens for ArF immersion exposure tool", Proc. SPIE 6154, Optical Microlithography XIX, 615421 (15 March 2006); https://doi.org/10.1117/12.656083

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