Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists

Shuhui Kang; Vivek M. Prabhu; Bryan D. Vogt; Eric K. Lin; Wen-Li Wu; Karen Turnquest

doi:10.1117/12.656594

29 March 2006 Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists

Shuhui Kang, Vivek M. Prabhu, Bryan D. Vogt, Eric K. Lin, Wen-Li Wu, Karen Turnquest

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61533N (2006) https://doi.org/10.1117/12.656594
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

A correlation between polymer molecular structure and acid catalyzed reaction kinetics is demonstrated by a photoresist copolymer with an acid-labile and a non-reactive monomer. The acid catalyzed deprotection kinetics depend significantly on the composition of the non-reactive comonomer in the polymer chain. The apparent reaction rate constant decreases monotonically with increasing non-reactive comonomer composition. The phenomena are interpreted as the reduction of diffusivity of photoacid in the polymer matrix from a hydrogen-bonding interaction with the polar group in the inert comonomer. In addition, hydrogen-bonding interactions between the photoacid and the reaction product, primarily methacrylic acid, can account for the acid loss or trapping effect observed by various researchers.

Citation Download Citation

Shuhui Kang, Vivek M. Prabhu, Bryan D. Vogt, Eric K. Lin, Wen-Li Wu, and Karen Turnquest "Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533N (29 March 2006); https://doi.org/10.1117/12.656594

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