The suppression method of powder formation in ArF photoresist

Geunsu Lee; Heesung Kim; Eungsok Lee; Myoungsoo Kim; Samyoung Kim; Cheolkyu Bok; Hyeongsoo Kim; Seungchan Moon; Jinwoong Kim

doi:10.1117/12.656860

29 March 2006 The suppression method of powder formation in ArF photoresist

Geunsu Lee, Heesung Kim, Eungsok Lee, Myoungsoo Kim, Samyoung Kim, Cheolkyu Bok, Hyeongsoo Kim, Seungchan Moon, Jinwoong Kim

Author Affiliations +

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61533F (2006) https://doi.org/10.1117/12.656860
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Powder formation of ArF photoresist in nozzle tip of track is very serious problem because particles of photoresist drop on wafer during process. To cope with this issue, we have studied several factors affecting powder formation in ArF photoresist processing such as polymer type, solvent for photoresist, thinner for solvent bath, and the structure of solvent bath. This report shows solutions for this issue. Chemical structure of polymer in ArF photoresist is the origin of powder formation but solvents for photoresist and thinner for solvent bath have an important role for improvement. Above all, the modification of solvent bath structure is most effective to remove this issue.

Citation Download Citation

Geunsu Lee, Heesung Kim, Eungsok Lee, Myoungsoo Kim, Samyoung Kim, Cheolkyu Bok, Hyeongsoo Kim, Seungchan Moon, and Jinwoong Kim "The suppression method of powder formation in ArF photoresist", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61533F (29 March 2006); https://doi.org/10.1117/12.656860

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