Adamantane based molecular glass resist for 193 nm lithography

Shinji Tanaka; Christopher K. Ober

doi:10.1117/12.658083

29 March 2006 Adamantane based molecular glass resist for 193 nm lithography

Shinji Tanaka, Christopher K. Ober

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61532B (2006) https://doi.org/10.1117/12.658083
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

As the feature dimensions decreases there are several issues must be addressed to implement the corresponding technology in high volume production. Line width roughness (LWR) and line edge roughness (LER) are the most important technological issue arises as the feature dimension decreases. In order to improve both of LWR and LER, we have developed novel low molecular weight glass resists as high performance resist materials. These molecular glass resists are adamantane derivatives and are highly transparent at 193 nm. We have prepared series of new molecular glass resists based on adamantane core carrying acetal and ester protecting groups. Particularly, adamantane core derivatives of tripod structure were investigated in detail. Several compositions of them showed glass transition temperatures (Tg) above 120 ^oC. Lithographic evaluation confirmed their high sensitivity at 254 nm and e-beam exposure. It also resolved feature size as small as 200 nm line/space when it evaluated using e-beam lithography. These new molecular glass resists also have high plasma-etch resistance.

Citation Download Citation

Shinji Tanaka and Christopher K. Ober "Adamantane based molecular glass resist for 193 nm lithography", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61532B (29 March 2006); https://doi.org/10.1117/12.658083

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