Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography

Masahiko Kitayama; Ichihiro Aratani; Minoru Toriumi

doi:10.1117/12.656159

29 March 2006 Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography

Masahiko Kitayama, Ichihiro Aratani, Minoru Toriumi

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61532A (2006) https://doi.org/10.1117/12.656159
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We report effects of methacrylates with polar group on resist performance determined by Quartz crystal microbalance (QCM) method. We found that high composition ratio of mevalonic lactone methacrylate accelerates dissolution of the resist film, which is suitable for high resolution resist. In addition, dissolution rate of the resist film depends on the structure of polar monomer. Also, a difference of swelling depending on the structure of polar monomer was observed in a low exposure dose. We think that the polymer polarity and acid dissociation energy of pendant group were influential to these phenomena. This information is also useful to develop new materials for ArF lithography.

Citation Download Citation

Masahiko Kitayama, Ichihiro Aratani, and Minoru Toriumi "Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61532A (29 March 2006); https://doi.org/10.1117/12.656159

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