Tools to measure CD-SEM performance

Jihoon Kim; Kiran Jalhadi; Sachin Deo; Soo-Young Lee; David Joy

doi:10.1117/12.650649

24 March 2006 Tools to measure CD-SEM performance

Jihoon Kim, Kiran Jalhadi, Sachin Deo, Soo-Young Lee, David Joy

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61520T (2006) https://doi.org/10.1117/12.650649
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

It is important to be able to quantify the imaging performance of CD-SEMs for such purposes as verifying the specification, rechecking after a routine maintenance, or for tool matching. To perform tests such as these it is necessary to have both appropriate software for image analysis and suitable test samples. A package of 2-D Fourier transform and analysis software, designed as a plug-in for the shareware IMAGE-Java program, has been developed and is freely available on line. The requirement for a reproducible and well characterized sample has been met by using direct-write electron beam lithography to fabricate suitable Fresnel zone plate structures.

Citation Download Citation

Jihoon Kim, Kiran Jalhadi, Sachin Deo, Soo-Young Lee, and David Joy "Tools to measure CD-SEM performance", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520T (24 March 2006); https://doi.org/10.1117/12.650649

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