Paper
23 February 2006 Investigation to planar optical waveguides based on oxidised porous silicon/PMMA-DR1 by dark mode spectroscopy method
Zhenhong Jia, Chuzhe Tu
Author Affiliations +
Abstract
The oxidised porous silicon layer with high porosity is obtained by anodization process followed by fully oxidation step. The planar optical waveguides is fabricated by penetrating polymer polymethylmetacrylate (PMMA-DR1) into the oxidised porous silicon film. The core layer of waveguide is formed by impregnating polymer into pores of oxidised porous silicon using method of immersion sample into PMMA-DR1/toluene solution under ultrasonic agitation in our experiment. The thickness of core of planar waveguides is controlled within 4μm by choice suitable immersion time. The waveguides consist of a higher index core oxidized oxidised porous silicon /PMMA-DR1 layer and a lower index buffer oxidised porous silicon layer separating the core from a high index silicon substrate. Optical parameters of waveguides are characterized by the dark mode spectroscopy method. Both refractive index and thickness of oxidised porous silicon /PMMA-DR1 film are obtained simultaneously and with good accuracy by measuring the coupling angles at the prism at a wavelength of 633 nm.
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Zhenhong Jia and Chuzhe Tu "Investigation to planar optical waveguides based on oxidised porous silicon/PMMA-DR1 by dark mode spectroscopy method", Proc. SPIE 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 615044 (23 February 2006); https://doi.org/10.1117/12.676528
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KEYWORDS
Silicon

Waveguides

Polymers

Prisms

Refractive index

Silicon films

Spectroscopy

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