Application study of measurement technology of the parameters on NEA photocathode

HuaiLin Chen; BenKang Chang; Yunsheng Qian

doi:10.1117/12.667739

23 January 2006 Application study of measurement technology of the parameters on NEA photocathode

HuaiLin Chen, BenKang Chang, Yunsheng Qian

Proceedings Volume 6029, ICO20: Materials and Nanostructures; 602916 (2006) https://doi.org/10.1117/12.667739
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China

Abstract

Because of its high photoemission performance, NEA photocathode has been developed rapidly and used widely in the recent several decades after it was found. In view of the problems existing in the research and producing of NEA photocathode, the study of property evaluation of NEA photocathode has been carried out in this paper. The spectral response decay of NEA photocathode has been measured, which provides valuable data for the stability research. The factors that influence the quantum yield of NEA photocathode are expounded. The characteristic parameters of NEA photocathode and the way of realizing property evaluation are introduced. The reflective GaAs samples are activated and evaluated by the activation and property evaluation system. The spectral response of NEA photocathode is measured on-line when it is being activated. The activation technique is analyzed and discussed combining with technology of XPS analysis. The property evaluation of NEA photocathode is realized. The properties of different NEA photocathode are compared. The problems in the research on NEA photocathode are pointed out.

Citation Download Citation

HuaiLin Chen, BenKang Chang, and Yunsheng Qian "Application study of measurement technology of the parameters on NEA photocathode", Proc. SPIE 6029, ICO20: Materials and Nanostructures, 602916 (23 January 2006); https://doi.org/10.1117/12.667739

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