Paper
9 November 2005 A new methodology for quantifying OPC recipe accuracy
David Ziger, Dave Gerold, Charles King, Frank Amoroso, Joshua Tuttle, Robert Lugg
Author Affiliations +
Abstract
An integrated methodology for developing recipes for optical proximity correction (OPC) is demonstrated. A complete implementation of software programs for generating the OPC corrections, determining mask and layout errors and automatically displaying contours of the worst violations has been accomplished. Integration of these elements facilitates recipe development by quantifying the effect of recipe changes on the overall critical dimension (CD) control. In this paper, a 65nm alternating aperture phase shift test mask is used for illustration of the method. The concept of a recipe comparison matrix is introduced to quantify the effect of recipe changes on across-chip metrics.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David Ziger, Dave Gerold, Charles King, Frank Amoroso, Joshua Tuttle, and Robert Lugg "A new methodology for quantifying OPC recipe accuracy", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599258 (9 November 2005); https://doi.org/10.1117/12.633172
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Optical proximity correction

Photomasks

Critical dimension metrology

Databases

Inspection

Lithography

Phase shifts

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