Vectorial effects in subwavelength mask imaging

Wen-Hao Cheng; Jeff Farnsworth; Theodore M. Bloomstein; Andrew Grenville

doi:10.1117/12.632372

4 November 2005 Vectorial effects in subwavelength mask imaging

Wen-Hao Cheng, Jeff Farnsworth, Theodore M. Bloomstein, Andrew Grenville

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 599218 (2005) https://doi.org/10.1117/12.632372
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

Ultra high numerical aperture (NA) enables extension of ArF lithography for the 45 technology node and beyond. The resulting changes in design rules drives feature sizes on the mask into the sub-wavelength regime. As 2-beam imaging techniques (off-axis illumination and alternating phase shift mask) are required for strong resolution enhancement in low-k1 lithography, traditional scalar and paraxial approximations used for optical image modeling are no longer valid in the ultra high NA regime. Vector and thick-mask based models are required to account for topographic effects and large angles of incident light at the reticle plane in ultra-high NA systems. Although vector-based imaging theory is well understood, experimental validation is required to ensure the appropriate topographical and optical parameters are being used. To address these issues, finite-difference time-domain rigorous electromagnetic simulation are compared to experimental measurements of the polarization dependent diffraction efficiencies on advanced optical reticles. Based on these results, the impact of mask induced polarization to vectorial imaging latitude is assessed. The impact of polarization purity, mask absorber profile, and Fresnel effects through the pellicle on process window and OPC are also discussed.

Citation Download Citation

Wen-Hao Cheng, Jeff Farnsworth, Theodore M. Bloomstein, and Andrew Grenville "Vectorial effects in subwavelength mask imaging", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 599218 (4 November 2005); https://doi.org/10.1117/12.632372

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available