Latest metrology results with the SOLEIL synchrotron LTP

Muriel Thomasset; Sylvain Brochet; Francois Polack

doi:10.1117/12.621073

15 September 2005 Latest metrology results with the SOLEIL synchrotron LTP

Muriel Thomasset, Sylvain Brochet, Francois Polack

Proceedings Volume 5921, Advances in Metrology for X-Ray and EUV Optics; 592102 (2005) https://doi.org/10.1117/12.621073
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

SOLEIL Long Trace Profiler (LTP) is a custom made instrument developed in the former LURE. As many instruments of its kind, it is based on pencil beam interferometry and uses the principle of stabilisation of the probe beam by a pentaprism equivalent reflector. The interferometer however is a polarization interferometer located close to the surface under test. The optics head can be configured to measure the optics in its working position: face up, face down or sideways. Particular care is given to absolute calibration because the precise knowledge of radii of curvature is required to determine the grazing angle and align accurately the synchrotron beamlines. A reproducible calibration procedure has been defined and checked against various reference surfaces. The main limitation to accuracy is the beam instability due to aur turbulence and thermal drifts. Careful confinement, oversampled acquisitions, and data averaging can minimize this effect. Noise is not uniformly distributed over spatial frequencies. In order to better understand the influence of beam footprint on the surface under test, and the characteristics of the beam fluctuation, we have constructed a special head where two measurements, one with a narrow pencil beam and interferometric detection and another with a large unmodulated beam and centroid detection, can be done simultaneously. The first results obtained from this device are presented here.

Citation Download Citation

Muriel Thomasset, Sylvain Brochet, and Francois Polack "Latest metrology results with the SOLEIL synchrotron LTP", Proc. SPIE 5921, Advances in Metrology for X-Ray and EUV Optics, 592102 (15 September 2005); https://doi.org/10.1117/12.621073

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available