Hopkins equation in Hilbert space and its application in polarized illumination modeling

Junjiang Lei; Min Bai; Jim Shiely; Lin Zhang

doi:10.1117/12.601196

12 May 2005 Hopkins equation in Hilbert space and its application in polarized illumination modeling

Junjiang Lei, Min Bai, Jim Shiely, Lin Zhang

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.601196
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

The ever-increasing demand for shrinkage of IC device dimensions has been pushing the development of new technologies in micro lithography. Polarized illumination source is one of the emerging techniques in lithography to increase wafer printability, especially for 65 nm features and below. In the mean time, most RET techniques, which are showing more and more importance in lithography, are based on a highly accurate optical lithography model and simulator. Consequently, simulation and modeling tools for optical lithography may have to include the effects of source polarization in thin film stacks. In this paper we discuss some theoretical aspects of vector modeling methods that are utilized for polarization modeling and show results from Synopsys’ simulation tool Progen.

Citation Download Citation

Junjiang Lei, Min Bai, Jim Shiely, and Lin Zhang "Hopkins equation in Hilbert space and its application in polarized illumination modeling", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.601196

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