Perfluoropolyethers as novel materials for soft lithography

Jason P. Rolland; Eric C. Hagberg; Kenneth R. Carter; Joseph M. DeSimone

doi:10.1117/12.598849

6 May 2005 Perfluoropolyethers as novel materials for soft lithography

Jason P. Rolland, Eric C. Hagberg, Kenneth R. Carter, Joseph M. DeSimone

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.598849
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Photocurable, liquid perfluoropolyethers (PFPEs) are ideal materials for high resolution (<100 nm) pattern transfer and imprint lithographic processes. PFPEs possess attributes of both elastomers and rigid materials, exhibit a remarkably low surface energy, mold extremely small features with high fidelity (minimal shrinkage), resist swelling by most organics, endure repetitive molding procedures, and out-perform routinely-used polydimethylsiloxane when replicating sub-micron sized features. We report nanoscale replicas of substrates, and the use of these replicas as molds, having features as small as 70 nm with no apparent loss of resolution.

Citation Download Citation

Jason P. Rolland, Eric C. Hagberg, Kenneth R. Carter, and Joseph M. DeSimone "Perfluoropolyethers as novel materials for soft lithography", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.598849

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