Multilayer coatings for the EUVL process development tool

E. Louis; E. Zoethout; R. W. E. van de Kruijs; I. Nedelcu; A. E. Yakshin; S. Alonso van der Westen; T. Tsarfati; F. Bijkerk; H. Enkisch; S. Muellender

doi:10.1117/12.619856

6 May 2005 Multilayer coatings for the EUVL process development tool

E. Louis, E. Zoethout, R. W. E. van de Kruijs, I. Nedelcu, A. E. Yakshin, S. Alonso van der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, S. Muellender

Author Affiliations +

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.619856
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Reported is a summary of the coating of three elements of the illuminator and three of the projection optics of the EUVL Process Development Tool. The coating process used is e-beam evaporation in combination with low energy ion beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65% and the non correctable figure error that is added by the full multilayer stack is controlled to better than 15 picometer.

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E. Louis, E. Zoethout, R. W. E. van de Kruijs, I. Nedelcu, A. E. Yakshin, S. Alonso van der Westen, T. Tsarfati, F. Bijkerk, H. Enkisch, and S. Muellender "Multilayer coatings for the EUVL process development tool", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.619856

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