Paper
11 March 2005 Progress toward board-level optical interconnect technology
Matthew L. Moynihan, Bruno Sicard, Tuan Ho, Luke Little, Nick Pugliano, James G. Shelnut, Hai Bin Zheng, Phil Knudsen, Dan Lundy, Nancy Chiarotto, Curtis Lustig, Craig Allen
Author Affiliations +
Abstract
Bandwidth demand is still growing and it is becoming more difficult for copper based interconnect technologies to meet system requirements. Considerable progress is being made in the development of optical interconnect technology. Recent publications have shown improved integration of turning mirrors and connectors for board level applications. This paper presents recent work on a siloxane-based waveguide material that is optimized for 850nm board level optical interconnect applications. The material under development is a negative acting photoimageable material that can be processed with conventional Printed Wire Board (PWB) or CMOS processing techniques and chemistries. Meter long waveguides have been fabricated on both silicon and FR4 substrates with optical loss performance of 0.027dB/cm and 0.067dB/cm respectively. Data illustrating the effect of bend radii and splitter performance is reported. Lastly, the ability of the siloxane material to withstand PWB fabrication and assembly processes such as lamination, metallization and reliability is demonstrated.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthew L. Moynihan, Bruno Sicard, Tuan Ho, Luke Little, Nick Pugliano, James G. Shelnut, Hai Bin Zheng, Phil Knudsen, Dan Lundy, Nancy Chiarotto, Curtis Lustig, and Craig Allen "Progress toward board-level optical interconnect technology", Proc. SPIE 5731, Photonics Packaging and Integration V, (11 March 2005); https://doi.org/10.1117/12.594675
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Cited by 18 scholarly publications.
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KEYWORDS
Waveguides

Silicon

Copper

Optical interconnects

Signal attenuation

Optics manufacturing

Polymers

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