Paper
24 February 2005 LOG-filter-based inspection of cluster Mura and vertical-band Mura on liquid crystal displays
Hsin-Chia Chen, Li-Te Fang, Louis Lee, Chao-Hua Wen, Shang-Yuan Cheng, Sheng-Jyh Wang
Author Affiliations +
Proceedings Volume 5679, Machine Vision Applications in Industrial Inspection XIII; (2005) https://doi.org/10.1117/12.586688
Event: Electronic Imaging 2005, 2005, San Jose, California, United States
Abstract
In this paper, we suggest to use a 2-D LOG filter to inspect Cluster Mura defects on the FOS images of LCDs, either for round-type Cluster Mura defects or rectangular-type Cluster Mura defects. With the 2-D LOG filter, the optimal threshold is analyzed with the SEMU formula. Also, we propose a curvature test approach to detect V-Band Mura defects. In the curvature test approach, a 1-D LOG filter is used to achieve the curve with the smooth curvature tendency. With this estimated curve, V-Band Mura defects could be detected easily. The FOS surface reconstruction verifies this detection approach in a reasonable way. Either for the Cluster Mura detection approach or for the V-Band Mura detection approach, the simulation results demonstrate the LOG filters is very useful in the development of detection algorithms for automatic optical inspection of Mura-like defects.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hsin-Chia Chen, Li-Te Fang, Louis Lee, Chao-Hua Wen, Shang-Yuan Cheng, and Sheng-Jyh Wang "LOG-filter-based inspection of cluster Mura and vertical-band Mura on liquid crystal displays", Proc. SPIE 5679, Machine Vision Applications in Industrial Inspection XIII, (24 February 2005); https://doi.org/10.1117/12.586688
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CITATIONS
Cited by 11 scholarly publications and 1 patent.
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KEYWORDS
Electronic filtering

LCDs

Inspection

V band

Defect detection

Algorithm development

Signal to noise ratio

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