SCANLINE - A Dedicated Fab Line SEM LW Measurement System

Rod Norville

doi:10.1117/12.949753

2 January 1986 SCANLINE - A Dedicated Fab Line SEM LW Measurement System

Rod Norville

Proceedings Volume 0565, Micron and Submicron Integrated Circuit Metrology; (1986) https://doi.org/10.1117/12.949753
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

Miniaturization in many industries has generated a need for sub-micron measurements. The most significant need is in the semiconductor industry for reproducible integrated circuit critical dimension measurements essential to characterizing circuit geometries. Line width measurements to date have been performed with light microscopes. As circuit element dimensions shrank toward the sub-micron region the fundamental resolution of the light microscope became the limiting factor. Conventional SEMs, with far greater resolution and depth of focus capabilities, were met with disappointment because they were designed as multi-purpose instruments without consideration for the unique problems associated with in-process SEM analysis of large, poorly conducting wafers in an environment of high magnetic fields and vibrations. The SCANLINE has been designed from the floor up to address these problems and to be an easy to operate sub-micron production measurement tool.

Citation Download Citation

Rod Norville "SCANLINE - A Dedicated Fab Line SEM LW Measurement System", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949753

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