Paper
3 January 2005 The application of super-RENS mask in high-density mastering
Author Affiliations +
Abstract
The non-linearity of the super-RENS mask can be used in optical data storage, which can greatly increase the disk’s density. Experiment is carried on the traditional mastering system with modification. We adopt the SiN/Sb/SiN multiplayer as the mask to insert the optical mask. For 413nm semiconductor laser and lens with NA=0.9, the diffraction limit is 200nm theoretically. Mark-120nm much smaller than that size is generated in the experiment. The thickness of Sb in the mask layers has much effect on the mastering signal intensity. For different power, we should control the thickness of Sb film. The experiments results show that the super-RENS mask can actually reduce the size of the mark obviously and realize the high density optical storage.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jie Song, Duanyi Xu, Guosheng Qi, and Quanhong Shen "The application of super-RENS mask in high-density mastering", Proc. SPIE 5643, Advances in Optical Data Storage Technology, (3 January 2005); https://doi.org/10.1117/12.574371
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Antimony

Photomasks

Photoresist materials

Crystals

Optical storage

Near field optics

Diffraction

Back to Top